High effective Compact preparative system containing UV-VIS DAD detector, preparative gradient pump, automatic inject valve and fraction collector.
Detector allows absorbance measuring on four wavelengths at the same time or scanning through entire spectra.
System is controlled by built-in PC and touch screen.
Modular solution allows to configure the unit according to customer needs. This system contains detector with wavelength range 190 –
800 nm, pump with flow rate up to 250 ml/min and fraction collector.
It is UV-VIS diode array detector, which allow measuring absorbance of four wavelengths in range of 190–800 nm simultaneously in one cell just as scanning of
whole spectra. Standardly is assembled with preparative cell PLCC07L, but other cells are available.
Fractions are collected according to chosen method, which is simply created using touch screen. Racks for 8, 21,40 ml tubes, 60 ml vials or 12 funnels, 30 mm.
Valve is driven by a stepmotor and it is automatically switched by software. System also allows manual sample injection by opened column.
Installed industrial PC with Intel Atom 4 core processor. OS Linux, Touch screen 12,1“ 1024 x 786, SW QUEEN controlls: gradient, flow rate, wavelengths,
fractions collection etc. Remote administration is available. Possibility of measuring at four wavelengths at the same time or scanning through entire spectra.
Furthermore, the possibility of displaying 3D data.
Modified for compact system, quaternary gradient pump with flow rate up to 250 ml/min (30 MPa at 100 ml/min and than linearly down up to 15 MPa at 250 ml/min). Unit software includes new learning algorithm for pulsation suppression and many testing and diagnostic functions.
| Interface | 3xUSB, 2xLAN, RS232 |
| Power supply | 100 - 240 V AC |
| Power input | 400 W |
| Dimensions W x H x D | 500 x 678 x 482 mm (19.69 x 26.69 x 18.98") |
| Weight | 55 kg (121.30 lb) |
| Wavelength range | 200 - 800 nm (256 elements on CCD) |
| Number of channels (Signals) | 4 |
| Scan | 200 - 800 nm,up to 20 Hz, step 1 nm |
| Typical spectral half-width | 10 nm |
| Accuracy of adjustment / Reproducibility | ± 1 nm / ±0.5 nm |
| Noise level at test cell (254 nm, TC 0.75s) | ± 5 x 10-5 AU |
| Drift at test cell (254 nm after 1 h) | 1 x 10-3 AU/hr |
| Materials in contact with mobile phase | FEP; fused silica, stainless steel, PEEK |
| Time constant (T63) | 0.5 s, 0.75 s, 1.0 s, 2.0 s, 4.0 s, 8.0 s, 16.0 s, 0.2 s, 0.1 s |
| Available racks (two racks per unit) | EC08 48 tubes of 8 ml (OD 12 mm) (384 ml/rack) EC21 36 tubes of 21 ml (OD 16 mm) (756 ml/rack) EC40 24 tubes of 40 ml (OD 20 mm) (960 ml/rack) EC60 20 vials of 60 ml (OD 27.5 mm) (1200 ml/rack) F12A 12 funnels, 30 mm |
| Maximum flow rate for tubes 8 ml | max. 50 ml/min |
| Maximum flow rate for tubes 21, 40 ml | max. 300 ml/min |
| Maximum flow rate for vials 60 ml | max. 300 ml/min |
| Maximum flow rate for funnels | max. 500 ml/min |
| Wetted materials | FEP, Tefzel®, PPS, KEL-F, PTFE, PEEK, SS 316, glass SIMAX |
| Input tubing | OD 1/8“ x ID 1/16“ FEP |
| Flow rate | 0.5 – 250 ml/min |
| Maximum operating pressure | 30 MPa (4351 PSI) up to 100 ml/min than linearly down up to 15 MPa (1450.5 PSI) at 250 ml/min |
| Flow rate setting | 0.1 ml/min steps |
| Repeatability of flow rate adjusting | ± 1 % |
| Accuracy of flow rate setting | ± 2 % |
| Wetted materials | stainless steel, PEEK, TefzelTM,PE, ceramic, seals * |
| Output capillary outer diameter | 1/8” |
| Input tubing outer diameter | 1/8” |
| Gradient valves control module - OPTIONALLY Up to | six valves |
| Interface | 3xUSB, 2xLAN, RS232 |
| Power supply | 100 - 240 V AC |
| Power input | 490 W |
| Dimensions | W x H x D 450 x 500 x 650 mm (17,72 x 19,69 x 25,59") |
| Weight | 55 kg (21,30 lb) |